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(MoneyNewsWire.Net, July 06, 2018 ) The lithography metrology equipment measures dimensions of circuit patterns on wafers. They are used for process control in wafer patterning, and reticles in mask shops and semiconductor fobs, particularly after the etch and mask processes of the process flow. Lithography metrology equipment primarily consists of three types of equipment: Critical dimension scanning electron microscope (CD-SEM), ellipsometer, and overlay tool.
Global Lithography Metrology Equipment Market to grow at a CAGR of 7.51% during the period 2018-2022.
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To calculate the market size, the report presents a detailed picture of the market by way of study, synthesis, and summation of data from multiple sources.
The market is divided into the following segments based on geography:
Americas
APAC
EMEA
Global Lithography Metrology Equipment Market 2018-2022, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.
Read more details of the report at: http://orbisresearch.com/reports/index/global-lithography-metrology-equipment-market-2018-2022
Key vendors
ADVANTEST
ASML
Hitachi High-Technologies
KLA-Tencor
Nanometrics
Market driver
Increasing demand for miniaturized electronic devices
For a full, detailed list, view our report
Market challenge
Rapid technological changes
For a full, detailed list, view our report
Market trend
Increase in wafer size
For a full, detailed list, view our report
Key questions answered in this report
What will the market size be in 2022 and what will the growth rate be?
What are the key market trends?
What is driving this market?
What are the challenges to market growth?
Who are the key vendors in this market space?
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Companies Mentioned:
ADVANTEST, ASML, Hitachi High-Technologies, KLA-Tencor, and Nanometrics.
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